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Title: 非晶矽/單晶矽吸光區累崩區分離累崩光二極體特性
Authors: 施能夫
Contributors: 修平技術學院電機工程系
Keywords: 非晶質
異質接面
雙載子
電晶體
Date: 2004-09
Issue Date: 2008-08-22T09:42:59Z
Abstract: 本研究以一個雙載子積體電路相容的製程來製作非晶矽/單晶矽吸光區累崩區分離累崩光二極體(SAM-APD)。為了避免元件製作時參數錯誤所造成試錯誤的時間浪費,在設計元件時先以元件模擬軟體及製程模擬軟體來模擬製造時所需要的參數。單晶矽的電子對電洞碰撞游離率比值遠大於1,而非晶質矽於可見光的光吸收係數十分恰當,這兩種材質的合併可導致高增益低雜訊的累崩光二極體。由於複雜的製程及未求最佳化,目前所得到的光增益為3.4。
Relation: 修平學報 9, 117-126
Appears in Collections:[Department of Electrical Engineering & Graduate Institute] Journal

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