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HUSTIR > College of Engineering > Department of Electronic Engineering > Monograph > Item 310993100/3309

Please use this identifier to cite or link to this item: http://ir.hust.edu.tw/dspace/handle/310993100/3309

Title:	銅鋁氧透明導電薄膜
Authors:	陳雍明;吳育霖
Contributors:	電子工程系
Keywords:	銅鋁氧
Date:	2012-12-26
Issue Date:	2013-07-23T06:27:20Z
Abstract:	在本次的研究中，主要是使用高真空濺鍍系統(射頻磁控濺鍍系統)製備銅鋁(CuAl)薄膜，討論氧分壓及基板溫度對薄膜光電性質的影響，接著以不同的溫度275℃、300℃ 和325℃ 以及1:1、1:3和3:1的氬氧流量比值做量測分析。量測銅鋁(CuAl)薄膜利用四點探針得到薄膜電阻率及紫外光(UV)光譜儀量測穿透率。本研究發現，在高氧分壓及低溫的情況下有較好的穿透率。
Appears in Collections:	[Department of Electronic Engineering] Monograph

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