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HUSTIR > College of Engineering > Department of Electronic Engineering > Monograph > Item 310993100/3328

Please use this identifier to cite or link to this item: http://ir.hust.edu.tw/dspace/handle/310993100/3328

Title:	陽極氧化臨場升溫鈦薄膜之二氧化鈦奈米管之光分解效應
Authors:	蔡承健吳凱清
Contributors:	電子工程系
Keywords:	TiO2 奈米管氧化還原
Date:	2012-01-17
Issue Date:	2013-07-23T06:47:05Z
Abstract:	本實驗採用射頻濺鍍機使用鈦靶沉積鈦薄膜於鈉玻璃上。在射頻濺鍍機上臨場加溫的鈦薄膜和事後處理的鈦薄膜經陽極處理后生長二氧化鈦奈米管。生長的鈦薄膜玻璃切取0.5 cm然後再使用掃描電鏡（SEM）觀察二氧化鈦的情況分析事後處理和臨場加溫的不同影響。紫外-可見光反射吸收光譜觀察生長后的二氧化鈦的穿透率。光譜色度分析儀是分析二氧化鈦奈米管在甲基藍氧化還原的變化。
Appears in Collections:	[Department of Electronic Engineering] Monograph

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