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Please use this identifier to cite or link to this item: http://ir.hust.edu.tw/dspace/handle/310993100/596

Title: 真空濺鍍腔體防著板調整機構 THE ADJUSTABLE MECHANISM OF THE SHIELDING PLATE IN THE SPUTTERING VACUUM CHAMBER DESIGN
Authors: 許耿禎
Contributors: 修平技術學院
Date: 2005-03-01
Issue Date: 2008-11-06T08:23:38Z
Abstract: 一種真空濺鍍腔體防著板調整機構,其係於真空腔體內左右兩側輪軸固定座之兩端各設有至少一調整機構,該調整機構各包括一防著板、一彈性元件及一調整螺絲,該防著板設於托盤與輪軸固定座之間,可用以阻隔鍍膜分子直接沉積在真空腔體底部及傳輸機構表面上,該彈性元件設於輪軸固定座所預設的一容置凹孔中,可用以推動防著板的一端向上或向下移動,該調整螺絲具有一螺紋部,係以螺紋部螺設於輪軸固定座所預設的螺孔上,其上端有一螺絲頭,位於防著板上方並卡住其一端,藉由調整螺絲的轉動來調整防著板與托盤之間的相對距離、傾斜角度及水平度,達到最佳化間隙狀態,可有效避免鍍膜分子沉積在托盤底部而造成真空腔體污染,進而提高鍍膜品質及設備稼動率,充分反應真實濺鍍狀況。
Appears in Collections:[Department of Electrical Engineering & Graduate Institute] Patents

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