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HUSTIR > College of Engineering > Department of Electronic Engineering > Monograph > Item 310993100/7973

Please use this identifier to cite or link to this item: http://ir.hust.edu.tw/dspace/handle/310993100/7973

Title:	FTO導電基板上成長BiFeO3:Al薄膜之研究
Authors:	蕭興澤王舜揚邱銘芳
Contributors:	電子工程系
Keywords:	溶膠凝膠薄膜多鐵電鐵電磁性介電性漏電流
Date:	2022-06
Issue Date:	2022-12-05T02:06:43Z
Abstract:	本論文利用溶膠凝膠(Sol-Gel)法在BFO 摻雜Al在FTO 玻璃基板上，並利用 RTA 快速升溫爐在常壓無通氧及升溫速率50oC/min下，進行熱退火處理溫度450 oC、500 oC、550 oC、600oC，利用XRD、SEM及阻抗分析儀量測BiFe1-xAlxO3 (x=0、0.02、0.04、0.06)薄膜的微結構、鐵電性、介電性等特性。探討不同熱退火處理溫度及不同含量的Al對薄膜的微結構、鐵電性、介電性的影響。
Appears in Collections:	[Department of Electronic Engineering] Monograph

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