Hsiuping University of Science and Technology Institutional Repository : Item 310993100/1409

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HUSTIR > College of Engineering > Department of Electronic Engineering > Journal > Item 310993100/1409

Please use this identifier to cite or link to this item: http://ir.hust.edu.tw/dspace/handle/310993100/1409

Title:	Plasma passivation of siloxane-based low-k polymeric films: a comparison of single and mixed (O2/N2/H2) gas sources
Authors:	S. T. Chen;G. S. Chen;T. J. Yang
Date:	2003
Issue Date:	2009-02-03T07:02:40Z
Relation:	J. Electrochem. Soc., 150, F194?F199. (SCI)
Appears in Collections:	[Department of Electronic Engineering] Journal

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