Hsiuping University of Science and Technology Institutional Repository : Item 310993100/1429

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HUSTIR > College of Engineering > Department of Electronic Engineering > Journal > Item 310993100/1429

Please use this identifier to cite or link to this item: http://ir.hust.edu.tw/dspace/handle/310993100/1429

Title:	The synergistic effect of N2/H2 gases in the plasma passivation of siloxane-based low-k polymer films’
Authors:	S. T. Chen;G. S. Chen;T. J. Yang;T. C. Chang;W. H. Yang
Date:	2003
Issue Date:	2009-02-03T07:03:42Z
Relation:	Electrochem. Solid-State Lett., 6, F4?F7. (SCI)
Appears in Collections:	[Department of Electronic Engineering] Journal

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