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HUSTIR > College of Engineering > Department of Electrical Engineering & Graduate Institute > Monograph > Item 310993100/2515

Please use this identifier to cite or link to this item: http://ir.hust.edu.tw/dspace/handle/310993100/2515

Title:	致冷晶片應用及最佳化探討
Authors:	邱孝昇
Contributors:	電機工程系
Keywords:	致冷晶片席貝克效應柏爾沾效應
Date:	2011-04-29
Issue Date:	2011-10-14T13:53:43Z
Abstract:	十九世紀半導體吸放熱原理被發現後，許多科學家便開始去琢磨其中可應用的範圍，直到大型半導體晶粒去實驗其循環過程發展到了二十世紀，利用最小奈米化的製成許多P型與N型半導體串接成一個效能明顯的致冷晶片。本專體系利用致冷晶片的冷熱端溫差去控制，可提供未來設計此類應用的設計者一個設計概念
Appears in Collections:	[Department of Electrical Engineering & Graduate Institute] Monograph

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