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HUSTIR > College of Engineering > Department of Electrical Engineering & Graduate Institute > Journal > Item 310993100/3506

Please use this identifier to cite or link to this item: http://ir.hust.edu.tw/dspace/handle/310993100/3506

Title:	以雷射光水平技術量測薄膜的應力
Authors:	劉文翔
Contributors:	修平技術學院電機工程學系
Keywords:	薄膜應力雷射光水平技術化學氣相沉積
Date:	2010-03
Issue Date:	2013-08-13T05:27:55Z
Abstract:	在大型積體電路製程中，若薄膜的製程技術不當，常會發生薄膜收縮，龜裂等問題，以致造成產品良率下降。因此如何量測薄膜的應力成為積體電路製程中另一項重要的課題。本文中利用雷射光水平技術量測二氧化矽 ( SiO2 )，氮化矽 ( Si3N4 ) 和金屬鋁 ( Al ) 等的薄膜。
Relation:	修平學報 20, 137-146
Appears in Collections:	[Department of Electrical Engineering & Graduate Institute] Journal

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