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HUSTIR > College of Engineering > Department of Electronic Engineering > Monograph > Item 310993100/5001

Please use this identifier to cite or link to this item: http://ir.hust.edu.tw/dspace/handle/310993100/5001

Title:	BiFO3薄膜在不同成長溫度下披覆於不鏽鋼基板之微結構與漏電流分析
Authors:	吳家銘徐尉軒劉冠玄鄂宗岳
Contributors:	修平科技大學電子工程系
Keywords:	速升溫爐
Date:	2015-12
Issue Date:	2016-05-14T08:06:08Z
Abstract:	"本研究以溶膠凝膠法製備BiFeO3 (BFO)多鐵性薄膜，透過旋轉塗佈法將薄膜分別沉積在不鏽鋼基板(stainless steel)和，並利用紅外線快速升溫爐(Rapid Thermal Annealing，RTA)進行退火處理。在本研究中將會加入铈(Ce)來探討其溫度變化對BFO 的特性影響。本實驗中藉由XRD 量測證實了BFO 薄膜成功的生長在不鏽鋼基板上，經XRD 圖來比較純BFO 和參雜Ce 的變化。因不同的成長溫度對於BiFeO3 薄膜的結構與特性有非常深遠的影響，本研究將BiFeO3 薄膜披覆於不鏽鋼基板上，且分別在450oC、500oC、550oC 的條件下進行高溫熱處理，並藉由X-ray 與I-V 量測分析其微結構與漏電流密度特性"
Appears in Collections:	[Department of Electronic Engineering] Monograph

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