Hsiuping University of Science and Technology Institutional Repository : Item 310993100/1394

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HUSTIR > College of Engineering > Department of Electronic Engineering > Journal > Item 310993100/1394

Please use this identifier to cite or link to this item: http://ir.hust.edu.tw/dspace/handle/310993100/1394

Title:	Growth mechanism of sputter deposited Ta and Ta-N thin films induced by an underlying titanium layer and varying nitrogen flow rates
Authors:	G. S. Chen;S. T. Chen;S. C. Huang;H. Y. Lee
Date:	2001
Issue Date:	2009-02-03T07:01:53Z
Relation:	Applied Surface Science, 169-170, pp. 353?357. (SCI)
Appears in Collections:	[Department of Electronic Engineering] Journal

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