Hsiuping University of Science and Technology Institutional Repository : Item 310993100/1543

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HUSTIR > College of Engineering > Department of Electronic Engineering > Monograph > Item 310993100/1543

Please use this identifier to cite or link to this item: http://ir.hust.edu.tw/dspace/handle/310993100/1543

Title:	非晶矽薄膜沉積
Authors:	蕭健宏;許孝銘;游朝清;翁彰隆
Contributors:	修平技術學院電子工程系
Keywords:	非晶矽薄膜沉積
Date:	2008/12/24
Issue Date:	2009-03-16T06:48:29Z
Publisher:	修平技術學院
Abstract:	本研究目的是利用射頻磁控濺鍍機，於不同溫度下，在矽基板及玻璃基板上成長矽。並探討他們在不同溫度製程條件下，在光線中吸收係數的情形。矽薄膜，利用射頻磁控濺鍍機成長出來的矽薄膜為非結晶相的。我們將用紫外線可見光(UV/VIS)光譜儀量測矽薄膜的吸收率，之後用公式做換算求得吸收係數，求得結果得知溫度越高它的吸收係數的值就越好。
Appears in Collections:	[Department of Electronic Engineering] Monograph

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